Ellipsometry measurements are ideal for thin film and multilayer characterization.
Generalized ellipsometry collects six values compared to the standard two (Ψ, ∆). This additional information completely characterizes the cross- polarization of anisotropic samples.
Ellipsometry can measure:
Wavelength range: 210 – 1690 nm.
Nr of wavelengths: 1065.
Incident angles: 45° – 90°.
Measure complete spectrum in 1/3 of a second.
Spot size: 120 μm.
Advanced measurement capabilities.
The RC2 is the first commercial spectroscopic ellipsometer to collect all 16 elements of
the Mueller matrix (allows characterization of the most advanced samples and nanostructures).
Best measurement accuracy.
Advanced measurement capabilities allow the best accuracy from fast CCD-based ellipsometry.
Dual rotating compensators.
Synchronous rotation of two compensators provides high accuracy, high speed, and complete Mueller-matrix measurements.
Achromatic compensator design.
New achromatic compensator design with optimized performance over a wide spectral range.
Wide spectral range.
Collect over 1000 wavelengths from the ultraviolet to the near infrared – all simultaneously.
Fast measurement speed.
Synchronous operation of both compensators allows highly accurate data without waiting to “zone-average” over optical elements. Collect the entire spectrum (over 1000 wavelengths) simultaneously in a fraction of a second.
Advanced “dual” light source.
Dual light source for extended spectral range with computer control of beam intensity. Automatically optimize signal on any sample (low or high reflection).